Job Description
Applied Materials, Inc. is the global leader in materials engineering solutions used to produce virtually every new chip and advanced display in the world. Our expertise in modifying materials at atomic levels and on an industrial scale enables customers to transform possibilities into reality. At Applied Materials, our innovations make possible the technology shaping the future.

Applied Materials’ HBI KPU is searching for an intern to join our team in summer 2024 for conducting algo development and application validation projects. The position will entail the following:
• Conducting computer vision algo development and data analytics to assist HBI development projects
• Conducting algo development and customization for semiconductor chip fabrication.

Requirements
• Student must be pursuing a Bachelor's or Masters degree program in Electrical Engineering or Computer Science or a related field
• Have done undergraduate coursework in Computer Vision, Image processing, Machine Learning.
• Student must be in good academic standing at their university, with a preferred GPA of 3.0 or above on a 4.0 scale
• Experience in Python (required) , and C++/C (desired).
• Quick learner and self-motivated

Compensation
$35 - $41 per hour
The salary offered to a selected candidate will be based on a number of factors including education level and will vary depending on confirmed job-related knowledge, skills, and experience

Qualifications
Education:
Skills
Certifications:
Languages:
Years Of Experience:
Work Experience:

Additional Information
Shift:

10-Day 8-Hr (United States of America)
Travel:
Yes, 10% of the Time

Relocation Eligible:
Yes

Referral Payment Plan:
None

Applied Materials is an Equal Opportunity Employer committed to diversity in the workplace. All qualified applicants will receive consideration for employment without regard to race, color, national origin, citizenship, ancestry, religion, creed, sex, sexual orientation, gender identity, age, disability, veteran or military status, or any other basis prohibited by law.